VertaPrime PLP

Our VertaPrime PLP is an automated low vacuum vapor deposition tool suitable for a wide range of substrates, such as glass and CCL.

It hosts two process chambers, one with vapor deposition module for silane vapor deposition and the other for curing the panel. With its enhanced control of three temperature zones with thermocouple feedback this tool helps achieve superior WiW and WtW thermal uniformity.

YES’s unique low vacuum one-step cure rapidly removes solvent from films during ramp allowing early start of cure process leading to high productivity due to reduced process time. VertaPrime PLP is suitable for applications that enables adhesion promotion, anti-stiction surfaces for emerging technologies.

Wafers

Runs two wafer sizes in parallel in large batch sizes.

Panels

Handles 510 × 515 mm dimensions down to 200 µm 
thickness without breakage.

Copper Eless

Efficient electroless plating of copper for both surface bonding and glass core liner.

Values

Optimal on-board chemical management

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Specialized handling with panel shock

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High throughput / low COO

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Applications

Glass Etch

Tested on multiple commercially available substrates, the glass core etch can be specified for specific glass needs.

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Applications

ENEPIG / ENIG

Electroless plating processes for enhanced bonding in advanced packaging.

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Applications

Metal Etch

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Standard Cleans

Metal etch capability for Cu, Ti, TiW, Ru, and more.

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Applications

Other

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Applications

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Values

Vapor deposition module

Dedicated chamber for uniform vapor deposition

Low vacuum one-step cure

High productivity due to reduced process time

Five-zone temperature control

≤1.5% temp uniformity with five-zone temperature control

Applications

Anti-stiction layers

Adhesion promotion

Surface modification

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