EcoClean

Highest throughput automatic plasma strip, descum, and cleaning system for space limited installations.

High polyimide, photoresist and metal oxide etch, and removal rate, from 100 Å/min (descum) to 100,000 Å/min (strip).

Handles wafers up to 200 mm with three gas mixing capability.

Wafers

Runs two wafer sizes in parallel in large batch sizes.

Panels

Handles 510 × 515 mm dimensions down to 200 µm 
thickness without breakage.

Copper Eless

Efficient electroless plating of copper for both surface bonding and glass core liner.

Values

Optimal on-board chemical management

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Specialized handling with panel shock

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High throughput / low COO

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Applications

Glass Etch

Tested on multiple commercially available substrates, the glass core etch can be specified for specific glass needs.

Values

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Applications

ENEPIG / ENIG

Electroless plating processes for enhanced bonding in advanced packaging.

Values

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Applications

Metal Etch

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Standard Cleans

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Other

Values

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Applications

Applications

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Values

High flexibility

Single system enables photoresist strip and descum, polyimide strip, organic removal, and copper oxide removal.

High throughput with small footprint

High etch rate and able to handle 60 wafers per hour.

Superior process control

Downstream plasma enables precision etch rate and protects device.

Applications

Photoresist strip / descum

Polyimide strip / descum

Metal oxide removal

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