G Series

The most flexible plasma cleaning system available for surface cleaning and modification.

Five plasma modes of operation range from mild downstream to aggressive plasma supported by 40 kHz RF or 13.56 MHz RF.

Handles substrates up to 300 mm with three gas mixing capability.

Wafers

Runs two wafer sizes in parallel in large batch sizes.

Panels

Handles 510 × 515 mm dimensions down to 200 µm 
thickness without breakage.

Copper Eless

Efficient electroless plating of copper for both surface bonding and glass core liner.

Values

Optimal on-board chemical management

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Specialized handling with panel shock

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High throughput / low COO

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Applications

Glass Etch

Tested on multiple commercially available substrates, the glass core etch can be specified for specific glass needs.

Values

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Applications

ENEPIG / ENIG

Electroless plating processes for enhanced bonding in advanced packaging.

Values

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Applications

Metal Etch

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Standard Cleans

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Other

Values

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Applications

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Values

High flexibility

Large chamber accommodates wide range of substrates shapes and types with movable shelves.

Broad applications

Multiple plasma modes enable various plasma cleaning requirements, such as wire-bond pre-clean and pre-epoxy clean.

Best choice for advanced devices

Real-time temperature monitor ensures substrate protection and process control.

Applications

Wafer, glass or free-form substrate cleaning

Contamination removal

Surface activation

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