VertaBond

The YES VertaBond™ vacuum furnace provides complete, reliable wafer and panel bonding in less time with a reduced thermal budget.

Superior bond strength as well as excellent particle performance come from the VertaBond’s precise temperature uniformity in a low vacuum environment.

Innovative manufacturers utilize VertaBond for demanding 3D stacking and heterogeneous integration applications in HBM and other critical areas.

Wafers

Runs two wafer sizes in parallel in large batch sizes.

Panels

Handles 510 × 515 mm dimensions down to 200 µm 
thickness without breakage.

Copper Eless

Efficient electroless plating of copper for both surface bonding and glass core liner.

Values

Optimal on-board chemical management

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Specialized handling with panel shock

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High throughput / low COO

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Applications

Glass Etch

Tested on multiple commercially available substrates, the glass core etch can be specified for specific glass needs.

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Applications

ENEPIG / ENIG

Electroless plating processes for enhanced bonding in advanced packaging.

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Applications

Metal Etch

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Standard Cleans

Metal etch capability for Cu, Ti, TiW, Ru, and more.

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Applications

Other

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Applications

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Values

Void-free hybrid bonding

Bonding in less time and at lower temperatures using a vacuum

Low wafer warpage

Less film stress from vacuum anneals produces better bonding properties and less wafer warpage

Vacuum anneal

Providing Cu-Cu bonding without voids, delamination, or dishing. Enabling 6 µm pitch with no voids or bubbles

Applications

WtW Hybrid Bonding

DtP Bonding

PtP Bonding

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