RFS

Single-wafer precision plasma strip, descum, and cleaning system - the tool of choice at R&D labs and universities worldwide.

Hot-plate temperature up to 250 °C enables etch rate from 100 Å/min (descum)
to 7,000 Å/min (strip).

Achieve higher yields and handles wafers, odd-shape substrates or pieces up to 200 mm with four gas mixing capability.

Wafers

Runs two wafer sizes in parallel in large batch sizes.

Panels

Handles 510 × 515 mm dimensions down to 200 µm 
thickness without breakage.

Copper Eless

Efficient electroless plating of copper for both surface bonding and glass core liner.

Values

Optimal on-board chemical management

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Specialized handling with panel shock

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High throughput / low COO

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Applications

Glass Etch

Tested on multiple commercially available substrates, the glass core etch can be specified for specific glass needs.

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Applications

ENEPIG / ENIG

Electroless plating processes for enhanced bonding in advanced packaging.

Values

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Applications

Metal Etch

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Standard Cleans

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Other

Values

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Applications

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Values

High flexibility

Single wafer plasma system supports photoresist strip and descum, polyimide strip, and organic removal.

Best-in-class uniformity and repeatability

Precision etch rate and hot-plate temperature control.

Best choice for advanced devices

Downstream plasma configuration protects against device electrical damage.

Applications

Photoresist / polyimide removal

Residue descum

Surface cleaning and preparation

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