VertaCure XP G2

A fully automated vacuum cure system, equipped with a five-zone uniform temperature control.

The single-step process enables short cure times and high throughput while delivering superior mechanical, thermal and electrical properties for a large variety of polyimide FO and passivation applications.

Offering 200 and 300 mm wafer compatibility, which is HVM proven performance at the world’s leading semiconductor fabs.

Wafers

Runs two wafer sizes in parallel in large batch sizes.

Panels

Handles 510 × 515 mm dimensions down to 200 µm 
thickness without breakage.

Copper Eless

Efficient electroless plating of copper for both surface bonding and glass core liner.

Values

Optimal on-board chemical management

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Specialized handling with panel shock

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High throughput / low COO

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Applications

Glass Etch

Tested on multiple commercially available substrates, the glass core etch can be specified for specific glass needs.

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Applications

ENEPIG / ENIG

Electroless plating processes for enhanced bonding in advanced packaging.

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Applications

Metal Etch

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Standard Cleans

Metal etch capability for Cu, Ti, TiW, Ru, and more.

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Applications

Other

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Applications

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Values

Laminar flow technology

Provides superior particle performance

Short cure time

Increases the throughput and throughput density, reducing the cost of ownership

Protects vacuum lines

Built-in condensate trap protects vacuum lines, valves, and vacuum pump from solvent condensates

Applications

Polyimide, PBO, and epoxy cure

Lower pressure polymer cure

Photoresist cure

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