VertaCure XP G2
A fully automated vacuum cure system, equipped with a five-zone uniform temperature control.
The single-step process enables short cure times and high throughput while delivering superior mechanical, thermal and electrical properties for a large variety of polyimide FO and passivation applications.
Offering 200 and 300 mm wafer compatibility, which is HVM proven performance at the world’s leading semiconductor fabs.
Values
Laminar flow technology
Provides superior particle performance
Short cure time
Increases the throughput and throughput density, reducing the cost of ownership
Protects vacuum lines
Built-in condensate trap protects vacuum lines, valves, and vacuum pump from solvent condensates