TersOnus TGV and Cavity Etch

Our high-throughput, low cost of ownership equipment affords an automated tool for all wet process for either panel or wafers.

Panels: Handles 510 × 515 mm panel dimensions, down to 200 µm thickness without breakage.

Wafers: Runs two wafer sizes in parallel, offering multiple dryer options for large batch sizes.

Wafers

Runs two wafer sizes in parallel in large batch sizes.

Panels

Handles 510 × 515 mm dimensions down to 200 µm 
thickness without breakage.

Copper Eless

Efficient electroless plating of copper for both surface bonding and glass core liner.

Values

Optimal on-board chemical management

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Specialized handling with panel shock

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High throughput / low COO

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Applications

Glass Etch

Tested on multiple commercially available substrates, the glass core etch can be specified for specific glass needs.

Values

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Applications

ENEPIG / ENIG

Electroless plating processes for enhanced bonding in advanced packaging.

Values

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Applications

Metal Etch

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Standard Cleans

Metal etch capability for Cu, Ti, TiW, Ru, and more.

Values

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Applications

Other

Values

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Applications

Applications

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Values

Process control

Offers tight temperature and fluid flow control.

Flexibility

Enables multiple substrate sizes and processes, tailored to customers’ processes and specifications.

Low cost of ownership

Reduces cost via high throughput and large batch sizes.

Applications

Electroless deposition

Metal / glass etch

Wet chemistries / clean / desmear / strip

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